Advanced lithography for printing microcircuits has long been restricted by international controls, a reality highlighted in comments to socialbites.ca by key researchers involved in a pioneering domestic lithograph project. The development, carried out with the cooperation of the National Center for Physics and Mathematics and supported by experts from the Institute for Microstructure Physics, underscores the ongoing effort to build independent capabilities in high-precision lithography.
The expert explained that even in the absence of sanctions, obtaining state-of-the-art lithography would be difficult because the most advanced systems have historically been tightly controlled by a major global power. Materials and equipment essential to chip fabrication were not readily accessible, complicating efforts to scale domestic production. This context makes the push for self-sufficiency in lithography all the more urgent, as researchers aim to reduce reliance on external suppliers and strengthen national technological sovereignty.
Nikolai Chkhalo, a leading researcher in multilayer X-ray optics at IPM, emphasized the strategic importance of establishing an indigenous lithography production path. He noted that the issue was recognized long ago, with many discussions taking place during the early, formative years. The prevailing stance then was that external suppliers would provide everything needed. Today, there is renewed hope for new partners, including developments in China. While China also does not have a fully established modern lithography industry, the current landscape creates a critical scenario that demands quick, practical steps toward domestic capability.
Readers can explore the prospects for advancing homegrown lithography and evaluate whether global leaders in this field can be influenced or matched by domestic initiatives in a forthcoming report from socialbites.ca, with attribution to the researchers involved.