Russian scientists developed the first X-ray lithography project in Russia. This was reported by NCFM’s press service.
Modern chips are produced by photolithography. Generally, a material is applied to the substrate and then “polished” with visible light, UV or X-ray radiation through a special mask with a hole pattern. Under the influence of radiation, the material changes its properties, and everything that is not exposed is washed away. In this way, layer by layer, a complex interweaving of microscopic electronics is created. Also, the shorter the radiation wavelength, the more efficient microcircuits can be produced using such a lithograph.
Now experts from the Institute for the Physics of Microstructures have created the first lithography project in Russia that works in the range of 11.2 nm (X-rays).
“We proposed a high-performance X-ray lithography project for the fabrication of microcircuits according to advanced technological standards, based on a radiation source with a wavelength of 11.2 nm. We have experimental results pointing to the possibilities of creating such a xenon-based radiation source. Under it, optics with a high reflection coefficient were developed – ruthenium-beryllium mirrors. “As part of the mirror optical scheme of lithography, it will be about 1.5 times more efficient than that created in foreign companies,” said physicist Nikolai Chkhalo, who worked on the project.
Scientists already have experimental samples of X-ray sources and masks, a prototype microscope for masks in the EUV range. However, the combination and scanning systems need to be seriously improved before the project becomes a reality. According to estimates, the project should be completed by 2030, and an alpha prototype will be built to perform all production operations in 2023-2024.
Formerly engineers created Online 3D model of a working lithium battery.